VICI Valco Helium Purifier and Nitrogen Purifier model:HP2

Carrier gas purity is essential in any application requiring extreme sensitivity. Impurities limit detector sensitivity and can even destroy capillary columns. The Valco HP2 (helium purifier) provides “point-of-use” purification of helium or other noble gases, such as Ar, Ne, Kr, and Xe,
to sub-ppm levels of reactive gaseous impurities. The NP2 (nitrogen purifier) is similar, purifying nitrogen to subppm levels of gaseous impurities. The purification substrate in Valco gas purifiers is a nonevaporable gettering alloy. This stable alloy is contained in a welded assembly, so the purifiers can be used safely in industrial applications with minimal precautions. Description and Operating Principle & Helium and Nitrogen Purifiers Analytical Components Systems Specifications
The getter is activated by heating, which eliminates the oxide film on the particle surface and allows helium to diffuse into the bulk of the getter particles. This leaves the surface free from the passivating oxide layers and available for sorption. Activation must be performed under a vacuum or inert gas (He, Ar, Kr, or Xe) atmosphere. The helium and nitrogen purifiers feature a self regulating design which eliminates the possibility of thermal runaway and maintains the getter material at the optimum temperature